How Do We Make An Integrated Circuit?

An integrated circuit can be made by following a step-by-step procedure. First take tons of sand and extract silicon and then refine it. Then this silicon should be placed in a special crucible with another substance known as dopant. This substance has the ability to determine the kind of electrical properties needed in the silicon. Heat the mixture and then keep it molten. Put a solid drop of silicon in the mixture and turn it at about 15rpm and pull it out slowly i.e. at I inch per hour. A crystal would be formed around the seed and one would get a long bar like single crystal with a diameter of about 4-6" in diameter and six foot in length. Cut the pointed ends of the crystal and cut it into thin slices and then clean it and make it flat and smooth rough edges. Dip one in concentrated acid solution and polish one side to obtain a perfect mirrored surface.

After that form an epitaxal semiconductor film on the polished side and induce a silicon oxide coating and add another coating of a "photoresist" lacquer. Cover it with a mask of the desired electronic pattern and expose it to ultraviolet light. Then expose it to a corrosive gas called plasma and add a coating of silicon and then repeat the last three steps to procure a second layer of circuitry. Continue this method for 11 times and each layer may have 1000 multilayered circuits. Cut them and mount it on a stamped harness made of lead wire and encapsulate it in a final package. This would constitute of an integrated circuit.